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<article language="en">
	<journal>
		<journal_title>Advances in Radio Science</journal_title>
		<journal_url>www.adv-radio-sci.net</journal_url>
		<issn>1684-9965</issn>
		<eissn>1684-9973</eissn>
		<volume_number>5</volume_number>
		<volume_title>Kleinheubacher Berichte 2006</volume_title>
		<publication_year>2007</publication_year>
	</journal>
	<doi>10.5194/ars-5-285-2007</doi>
	<article_url>http://www.adv-radio-sci.net/5/285/2007/</article_url>
	<abstract_html>http://www.adv-radio-sci.net/5/285/2007/ars-5-285-2007.html</abstract_html>
	<fulltext_pdf>http://www.adv-radio-sci.net/5/285/2007/ars-5-285-2007.pdf</fulltext_pdf>
	<start_page>285</start_page>
	<end_page>290</end_page>
	<publication_date>2007-06-13</publication_date>
	<article_title content_type="html">Analog circuits using FinFETs: benefits in speed-accuracy-power  trade-off and simulation of parasitic effects</article_title>
	<authors>
		<author numeration="1" affiliations="1">
			<name>M. Fulde</name>
			<email>fulde@tum.de</email>
		</author>
		<author numeration="2" affiliations="2,3">
			<name>J. P. Engelstädter</name>
		</author>
		<author numeration="3" affiliations="2">
			<name>G. Knoblinger</name>
		</author>
		<author numeration="4" affiliations="1">
			<name>D. Schmitt-Landsiedel</name>
		</author>
	</authors>
	<affiliations>
		<affiliation numeration="1" content_type="html">Institute of Technical Electronics, Technical University Munich, Germany</affiliation>
		<affiliation numeration="2" content_type="html">Infineon Technologies AG, Villach, Austria</affiliation>
		<affiliation numeration="3" content_type="html">Department of Electrical Engineering, RWTH Aachen University, Aachen, Germany</affiliation>
	</affiliations>
	<abstract content_type="html">Multi-gate FET, e.g. FinFET devices are the most promising contenders to
replace bulk FETs in sub-45 nm CMOS technologies due to their improved sub
threshold and short channel behavior, associated with low leakage currents.
The introduction of novel gate stack materials (e.g. metal gate, high-k
dielectric) and modified device architectures (e.g. fully depleted, undoped
fins) affect the analog device properties significantly. First measurements
indicate enhanced intrinsic gain (&lt;i&gt;g&lt;sub&gt;m&lt;/sub&gt;/g&lt;sub&gt;DS&lt;/sub&gt;&lt;/i&gt;) and promising matching
behavior of FinFETs. The resulting benefits regarding the
speed-accuracy-power trade-off in analog circuit design will be shown in this
work. Additionally novel device specific effects will be discussed. The
hysteresis effect caused by charge trapping in high-k dielectrics or
self-heating due to the high thermal resistor of the BOX isolation are
possible challenges for analog design in these emerging technologies. To gain
an early assessment of the impact of such parasitic effects SPICE based
models are derived and applied in analog building blocks.</abstract>
	<references>
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</article>

